next up previous
Next: Conclusions Up: Integration and Application of Previous: Source-Level Instrumentation

Measurement Overhead

 

Software-based instrumentation schemes have a runtime overhead that intrudes on application execution, possibly perturbing its performance [7]. It is impossible to completely eliminate this overhead, but it can be quantified and its effects evaluated to some extent. We have attempted to characterize the overhead that TAU generates in the execution of the Java application. Since TAU instrumentation is typically triggered at entry, exit, and initialization of methods, we break up the overhead in these three categories. We also consider the overhead when only profiling is enabled, and when profiling and tracing is selected.

As described earlier, TAU requires the use of JVMPI for performance measurement for two reasons. First, it gives a convenient mechanism for observing method entry/exit events and other JVM actions. Second, even if an alternative instrumentation approach was used, such as directly in the Java source or in JNI- linked libraries, JVMPI is the only current mechanism to obtain thread information and JVM state data. In evaluating TAU overhead, we are concerned with both the absolute overhead as well as the relative overhead in contrast to the JVMPI overhead. Although a full characterization of JVMPI overheads is beyond the scope of this paper, our experience is that a JVMPI-enabled application (without any performance measurement) can see performance delays. Because TAU executes native code in the JVM address space, its efficiency should be high save for JVMPI interactions. If, in the future, the JVMPI capabilities that TAU utilizes are offered by some other, more efficient means, the overhead of having JVMPI enabled may be avoided.

The experimental apparatus to quantify TAU measurement overhead is based on how classes are instrumented. Java supports dynamic loading of class bytecode in the virtual machine during program execution. This allows TAU to instrument only those classes that are loaded in the virtual machine, as opposed to all the classes. When a class is loaded, TAU examines the names of methods and creates timers for each method. To determine this cost of instrumenting a class, we can divide the time for loading a class by the number methods it contains to give an estimate of the fixed cost of method initialization. We measure all costs in terms of elapsed wall-clock time obtained by the system call gettimeofday. In a similar fashion, we measured overheads for method entry and method exit. All measurements take place after JVMPI calls the TAU profiler agent. Here we consider the standard time measurement where profile information is updated and trace data is optionally generated.

Table 1 shows the profiling overhead measurements in association with the overhead when tracing is also enabled. The overhead seen in this table includes disk I/O for storing the profile information at the end of the application or for saving per-thread trace buffers. We compute the cost of the gettimeofday call on the system and compensate for it while measuring the overhead associated with method loading, entry, and exit. The TAU overhead for each method is different and is influenced by the time spent looking up the mapping table, string operations that depend upon the length of a method name, load on the system, and other platform specific parameters. However, we can compute average costs and give an estimate for a specific platform. From the table, we see that method loading costs 30.28 microseconds on the average, and it costs 2.67 microseconds for method entry and 1.16 microseconds for method exit during profiling. The costs are a little higher when we generate both profiles and event-traces. The measurements were made on a quad Pentium III Xeon/550 MHz, 3GB RAM symmetric multiprocessor machine with the following software environment:

TAU currently does not employ any means for compensating for the perturbation caused by the instrumentation. General techniques for compensating for instrumentation perturbation are addressed in [7].



next up previous
Next: Conclusions Up: Integration and Application of Previous: Source-Level Instrumentation



Sameer Suresh Shende
Mon Mar 12 14:44:42 PST 2001